A New Solvent-Soluble Resist for Lithography.

Modern lithographic printing has for the most part been concerned with properties and problems of water-soluble resist materials which have been made light-sensitive with bichromates. Shortcomings of such systems are well known and are presented along with some modern trends. New data are presented concerning properties of a new solvent-soluble resist material called Kodak Photo Resist. The new material can be described as a light-sensitive lacquer; the light-sensitivity is obtained through an inherently light-sensitive organic molecule. Tone-reproduction curves are shown for this resist and for another commercially available surface coating.